DIRECT BURIAL COPPER-COPPER SULFATE HALF CELL REFERENCE ELECTRODE

Description

Model: DB-A Direct Burial Half Cell Reference Electrode CuCu/SO4   Features Copper-Copper/Sulfate reference electrode Certified Copper rod to 99.9%, CUSO (4) Proprietary, non-tip electrode, with direct exposure of copper sulfate mixture to backfill/soil Large surface area of exposed copper sulfate mixture Long Life – 10 + years Use with rapid-wetting backfill Encapsulate fill area for permanent water seal of wire connection Rugged construction Body made of PVC/ABS Instrument Includes: DB-A Instrument Instructions Manual Model DB-A Copper-Copper/Sulfate Reference Electrode designed for direct burial for long term monitoring of buried or earth contacting structures. Applications Under Ground Without Chloride (<500 PPM) or Fresh Water Or Sea Water Contamination Pipelines Tank Farms Where ever leave behind direct burial is required Where ever CuCu/So4 is required PRODUCT DATA SHEETS

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